HPLC Method for Separation of m-Xylylenediamine, 2,4,6-Tris(dimethylaminomethyl)phenol on BIST B and BIST B+ Columns by SIELC Technologies

m-Xylylenediamine (MXDA) is a popular curing agent used on epoxy resins with the chemical formula C₈H₁₂N₂. When MXDA undergoes the Sommelet reaction, it results in a isophthalaldehyde. You can find detailed UV spectra of m-Xylylenediamine and information about its various lambda maxima by visiting the following link.

2,4,6-Tris(dimethylaminomethyl)phenol is an organic compound with the chemical formula C₁₅H₂₇N₃O. It is amine-based curing agent used on epoxy resins and as an accelerator for epoxy resin curing agents. It is considered to be one of the most widely used room temperature accelerators for two-component resin systems. Less commonly, it is used in polyurethane chemistry. You can find detailed UV spectra of 2,4,6-Tris(dimethylaminomethyl)phenoland information about its various lambda maxima by visiting the following link.

Using SIELC’s newly introduced BIST™ method, m-Xylylenediamine, 2,4,6-Tris(dimethylaminomethyl)phenol can be retained and separated on a positively charged, anion-exchange BIST B column. The surface chemistry of BIST™ B+ columns are designed to have stronger ionic retention capabilities, resulting in the marked increase in retention compared to BIST™ B columns.

There are two keys to this retention method: 1) a multi-charged, negative buffer, such as Sulfuric acid (H2SO4), which acts as a bridge, linking the positively charged dipeptide to the positively charged column surface and 2) a mobile phase consisting mostly of organic solvent (such as MeCN) to minimize the formation of a solvation layer around the charged analytes. Using this new and unique analysis method, these two amines can be UV detected at 210 nm.

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